Open-source computational lithography workflow, manufacturability benchmarking, and foundation model data engine.
We bridge the gap between academic AI lithography research and industrial mask manufacturing — targeting EUV stochastics, curvilinear masks, and the OASIS.MBW ecosystem.
| Layer | Purpose |
|---|---|
| Unified Data Adapter | One interface for LithoBench, LithoSim, and beyond |
| Manufacturability Benchmark | EUV stochastic robustness, MRC/DRC checks, shot count |
| OASIS Workflow Engine | Tensor → B-spline → OASIS.MBW 2.1 for multi-beam writers |
| Leaderboard & Data Engine | SOTA tracking + paired dataset generation for EDA foundation models |
git clone https://github.com/OpenLithoHub/OpenLithoHub.gitRead the full Strategic Whitepaper | 中文版
All projects under this organization are released under Apache 2.0.